Process shield for a substrate processing chamber



FIG. 1 is a top isometric view of a process shield for a substrateprocessing chamber, showing our new design;

FIG. 2 is a bottom isometric view thereof;

FIG. 3 is a top plan view thereof;

FIG. 4 is a bottom plan view thereof;

FIG. 5 is a front elevation view thereof;

FIG. 6 is a back elevation view thereof;

FIG. 7 is a left side elevation view thereof;

FIG. 8 is a right side elevation view thereof; and,

FIG. 9 is an enlarged cross sectional view taken along line 9-9 in FIG.3.

The dashed lines in FIGS. 1-9 represent unclaimed environment forming nopart of the claimed design.

CLAIM The ornamental design for a process shield for a substrateprocessing chamber, as shown and described.